The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Jul. 20, 2022
Applicant:

United Microelectronics Corp., Hsin-Chu City, TW;

Inventors:

Yung-Chen Chiu, Tainan City, TW;

Chi-Horn Pai, Tainan City, TW;

Sheng-Yuan Hsueh, Tainan City, TW;

Kuo-Hsing Lee, Hsinchu County, TW;

Chih-Kai Kang, Tainan City, TW;

Assignee:

UNITED MICROELECTRONICS CORP., Hsin-Chu City, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 20/25 (2023.01);
U.S. Cl.
CPC ...
H10B 20/25 (2023.02);
Abstract

A method for fabricating a semiconductor device includes the steps of first providing a substrate comprising an one time programmable (OTP) device region, forming a shallow trench isolation (STI) in the substrate, removing part of the STI to form a first step on a corner of the substrate, forming a first gate oxide layer on the substrate, removing the first gate oxide layer to form a second step on the corner of the substrate, forming a second gate oxide layer on the substrate, and then forming a first gate structure on the substrate and the STI.


Find Patent Forward Citations

Loading…