The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2026
Filed:
Sep. 30, 2021
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Duk Hyun Son, Cheonan-si, KR;
Yu Ri Son, Busan, KR;
Assignee:
SEMES Co., Ltd., Cheonan-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/244 (2006.01); G01N 15/06 (2024.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/244 (2013.01); G01N 15/06 (2013.01); H01J 37/32449 (2013.01); H01J 37/32816 (2013.01); H01J 37/32899 (2013.01); H01J 2237/24585 (2013.01);
Abstract
Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a load lock chamber, of which a pressure of an interior space is changed between a first pressure and a second pressure that is lower than the first pressure, an index chamber connected to the load lock chamber, and a measurement unit that measures a level of particles in the interior space, and the measurement unit is located outside the load lock chamber.