The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Nov. 18, 2022
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Takayuki Nagasawa, Joetsu, JP;

Jun Hatakeyama, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); C09D 5/24 (2006.01); C09D 7/45 (2018.01); C09D 7/65 (2018.01); C09D 139/02 (2006.01); C09D 179/02 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/093 (2013.01); C09D 5/24 (2013.01); C09D 7/45 (2018.01); C09D 7/65 (2018.01); C09D 139/02 (2013.01); C09D 179/02 (2013.01); G03F 7/2022 (2013.01);
Abstract

A conductive polymer composition containing: (A) a polyaniline-based conductive polymer having a repeating unit represented by following general formula (1); and (B) polymer having structure represented by following general formula (2). In formulae, each of Rto Rrepresents hydrogen atom, acidic group, hydroxy group, alkoxy group, carboxy group, nitro group, halogen atom, or hydrocarbon group, Rand Reach independently represent a hydrogen atom, linear, branched, or cyclic alkyl group having 1-10 carbon atoms or a hydrocarbon group containing a hetero atom, Xrepresents anion, and 'a' represents valence. The conductive polymer composition has good filterability and film-formability of flat film on electron beam resist and can be used suitably for antistatic film for electron beam resist writing showing excellent antistatic property in electron beam writing process, and, reducing effect of acid diffused from film to minimum, and also having excellent peelability.


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