The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2026

Filed:

Jul. 28, 2021
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Takashi Hiroi, Tokyo, JP;

Yuko Otani, Tokyo, JP;

Yuya Isomae, Tokyo, JP;

Muneyuki Fukuda, Tokyo, JP;

Masakazu Kanezawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/2251 (2018.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); G01N 2223/401 (2013.01); G01N 2223/6116 (2013.01);
Abstract

The purpose of the present disclosure is to provide a technology which enables, in a step for analyzing a defect of an element, identification of the position of the defect even in a case where the defect is thin or there is an influence of contamination. An inspection apparatus according to the present disclosure irradiates a first region including a defect of a sample with a low-energy first electron beam and then generates a second electron beam image obtained by irradiating a second region including the first region with a high-energy second electron beam, and identifies the position of the first region in the second electron beam image, thereby identifying the position of the defect.


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