The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2026
Filed:
Dec. 12, 2023
International Business Machines Corporation, Armonk, NY (US);
Tsung-Sheng Kang, Ballston Lake, NY (US);
Tao Li, Slingerlands, NY (US);
Ruilong Xie, Niskayuna, NY (US);
Min Gyu Sung, Latham, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Embodiments of the present disclosure are directed to processing methods and resulting structures for providing a backside placeholder dielectric fill to enable robust backside source/drain contacts. In a non-limiting embodiment, nanosheets having a first width are formed in a first region and nanosheets having a second width greater than the first width are formed in a second region. The first region includes a first S/D region and a second S/D region electrically coupled to a backside contact and a frontside contact, respectively. The second region includes a third S/D region and a fourth S/D region electrically coupled to a backside contact and a frontside contact, respectively. The method includes forming a backside placeholder having an air gap in the first region and forming a backside placeholder having a dimple in the second region.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile