The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2026
Filed:
Apr. 20, 2023
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2006.01); C01B 33/035 (2006.01);
U.S. Cl.
CPC ...
C01B 33/035 (2013.01); C01P 2004/12 (2013.01);
Abstract
The present invention is related to a polycrystalline silicon rod manufactured with a Siemens method. The polycrystalline silicon rod having a length of 1 m or more in a longitudinal direction. An absolute value of a difference between compressive stress and tensile stress in residual stress in the longitudinal direction on a circumferential surface of the polycrystalline silicon rod is 22 MPa or less.
Okada, Tetsuro. (2026). Polycrystalline silicon rod and process of manufacturing polycrystalline silicon rod (U.S. Patent No. 12668493). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12668493
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile