The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Sep. 22, 2021
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Benjamin Orr, Beaverton, OR (US);

Nicholas A. Thomson, Hillsboro, OR (US);

Ayan Kar, Portland, OR (US);

Nathan D. Jack, Forest Grove, OR (US);

Kalyan C. Kolluru, Portland, OR (US);

Patrick Morrow, Portland, OR (US);

Cheng-Ying Huang, Hillsboro, OR (US);

Charles C. Kuo, Hillsboro, OR (US);

Assignee:

INTEL CORPORATION, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 84/01 (2026.01); H10D 8/00 (2025.01); H10D 8/01 (2025.01); H10D 84/03 (2025.01); H10D 84/80 (2025.01); H10D 84/85 (2025.01); H10D 88/00 (2026.01);
U.S. Cl.
CPC ...
H10D 84/01 (2025.01); H10D 8/045 (2025.01); H10D 84/017 (2025.01); H10D 84/038 (2025.01); H10D 84/811 (2025.01); H10D 84/856 (2025.01); H10D 88/00 (2025.01);
Abstract

Integrated circuits including vertical diodes. In an example, a first transistor is above a second transistor. The first transistor includes a first semiconductor body extending laterally from a first source or drain region. The first source or drain region includes one of a p-type dopant or an n-type dopant. The second transistor includes a second semiconductor body extending laterally from a second source or drain region. The second source or drain region includes the other of the p-type dopant or the n-type dopant. The first source or drain region and second source or drain region are at least part of a diode structure, which may have a PN junction (e.g., first and second source/drain regions are merged) or a PIN junction (e.g., first and second source/drain regions are separated by an intrinsic semiconductor layer, or a dielectric layer and the first and second semiconductor bodies are part of the junction).


Find Patent Forward Citations

Loading…