The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Dec. 22, 2021
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Christopher J. Jezewski, Portland, OR (US);

Matthew V. Metz, Portland, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 64/62 (2025.01); H10D 30/01 (2025.01); H10D 30/62 (2025.01); H10D 30/67 (2025.01); H10D 62/10 (2025.01); H10D 64/01 (2025.01); H10D 84/01 (2026.01); H10D 84/03 (2025.01); H10D 84/85 (2025.01); H10P 14/20 (2026.01); H10P 14/40 (2026.01); H10P 50/26 (2026.01);
U.S. Cl.
CPC ...
H10D 64/62 (2025.01); H10D 30/031 (2025.01); H10D 30/6219 (2025.01); H10D 30/6735 (2025.01); H10D 30/6757 (2025.01); H10D 62/118 (2025.01); H10D 64/0116 (2026.01); H10D 84/0167 (2025.01); H10D 84/0186 (2025.01); H10D 84/038 (2025.01); H10D 84/85 (2025.01); H10P 14/3452 (2026.01); H10P 14/418 (2026.01); H10P 50/262 (2026.01);
Abstract

Complementary metal-oxide-semiconductor (CMOS) devices and methods related to selective metal contacts to n-type and p-type source and drain semiconductors are discussed. A p-type metal is deposited on n- and p-type source/drains. The p-type metal is selectively removed from the n-type source/drains but remains on dielectric materials adjacent the n-type source/drains. An n-type metal is deposited on the n-type source/drains while the remaining p-type metal seals the dielectric materials to protect the n-type metal from contamination. The n-type metal is then sealed using another p-type metal. A contact fill material contacts the resultant source and drain contact stacks.


Find Patent Forward Citations

Jezewski, Christopher. (2026). Low resistance metal to semiconductor contacts for integrated nmos and pmos transistors (U.S. Patent No. 12666688). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12666688

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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