The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
May. 24, 2022
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Mario Laengle, Jena, DE;
Dmitry Klochkov, Schwaebisch Gmuend, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06V 20/69 (2022.01); G06T 7/00 (2017.01); G06T 7/11 (2017.01); G06T 7/12 (2017.01); G06T 7/13 (2017.01); G06V 10/26 (2022.01); G06V 10/30 (2022.01); G06V 10/44 (2022.01); G06V 30/20 (2022.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G06T 7/12 (2017.01); G06V 10/26 (2022.01); G06V 10/30 (2022.01); G06V 10/457 (2022.01); G06V 20/695 (2022.01); G06V 20/698 (2022.01); G06T 2207/30148 (2013.01); G06V 2201/06 (2022.01);
Abstract
The invention relates to a method and to an apparatus for analyzing an image of a microlithographic microstructured component wherein in the image each of a multiplicity of pixels is assigned in each case an intensity value. A method according to the invention comprises the following steps: isolating a plurality of edge fragments in the image; classifying each of the isolated edge fragments either as a relevant edge fragment or as an irrelevant edge fragment; and ascertaining contiguous segments in the image based on the relevant edge fragments.