The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2026

Filed:

Mar. 22, 2023
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Hans-Joachim Schulze, Taufkirchen, DE;

Rudolf Elpelt, Erlangen, DE;

Jens Peter Konrath, Villach, AT;

Konrad Schraml, Feldkirchen, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/16 (2006.01); H10D 12/00 (2025.01); H10D 12/01 (2025.01); H10D 30/01 (2025.01); H10D 30/66 (2025.01); H10D 62/832 (2025.01); H10D 62/85 (2025.01);
U.S. Cl.
CPC ...
H10D 62/8325 (2025.01); H10D 12/031 (2025.01); H10D 12/032 (2025.01); H10D 12/441 (2025.01); H10D 30/0291 (2025.01); H10D 30/66 (2025.01); H10D 62/8503 (2025.01);
Abstract

A wide band gap semiconductor device includes a semiconductor body having a first surface and a second surface opposite to the first surface along a vertical direction. The semiconductor device further includes a first region of a first conductivity type adjoining at least partially the first surface, a drift region of a second conductivity type, a highly doped second region adjoining the second surface, and a buffer region of the second conductivity type arranged between the drift region and the highly doped second region. A vertical profile of a doping concentration of the buffer region includes at least one step in a first section and is increasing approximately exponentially toward the second surface in a second section. The first section is arranged between the second section and the highly doped second region.


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