The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Jun. 21, 2021
The Regents of the University of California, Oakland, CA (US);
Brian Romanczyk, Santa Barbara, CA (US);
Umesh K. Mishra, Montecito, CA (US);
Pawana Shrestha, Goleta, CA (US);
Matthew Guidry, Goleta, CA (US);
James Buckwalter, Pasadena, CA (US);
Stacia Keller, Santa Barbara, CA (US);
Rohit Reddy Karnaty, Goleta, CA (US);
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, Oakland, CA (US);
Abstract
Derivative cancellation techniques have been used to linearize transistors using multiple discreet devices. However at frequencies approaching and in the mm-wave regime the use of individual devices no longer works due to the parasitics associated with combining the devices. In this invention device structures are described which apply the derivative cancellation technique in a single device thus removing the detrimental impact of combining. In one example, an N-polar transistor structure includes a channel; a cap structure comprising a plurality of cap layers on or above the channel; a source contact and a drain contact to the channel; and a castellated, stepped, or varying pattern formed in the cap layers so that gate metal deposited on the pattern forms at least two different threshold voltages and current combines in the ohmic region with essentially zero parasitic inductance.