The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 16, 2026

Filed:

Jul. 10, 2024
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Adam Faust, Rehovot, IL;

Yosi Basson, Rehovot, IL;

Ittamar Levy, Rehovot, IL;

Mor Battat, Rehovot, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 2237/2007 (2013.01);
Abstract

An electrostatic chuck, that includes (a) an electrostatic chuck body having a top surface and being configured to support a sample; (b) a space formed within the electrostatic chuck body, the space has a top opening; (c) a sharp conductive element; (d) a masking electrode; and (e) a movement unit that is configured to position the masking electrode in a masking position in which the masking electrode reduce an electric field formed by the sharp conductive element when the sharp conductive element is being biased and the top opening is not covered by a backside of the sample.


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