The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
May. 31, 2023
Applicant:
Ebara Corporation, Tokyo, JP;
Inventors:
Kenji Watanabe, Tokyo, JP;
Takeshi Murakami, Tokyo, JP;
Yasushi Toma, Tokyo, JP;
Ryo Tajima, Tokyo, JP;
Tsutomu Karimata, Tokyo, JP;
Assignee:
EBARA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/2251 (2018.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); H01J 37/244 (2013.01); G01N 2223/20 (2013.01); G01N 2223/418 (2013.01); H01J 37/28 (2013.01);
Abstract
Provided is a method of evaluating a deviation of a trajectory of a primary electron beam in a primary optical system in an electron beam observation device including the primary optical system that irradiates a sample with the primary electron beam including a plurality of primary electrons and a secondary optical system that detects, by a detector, a secondary electron beam including a plurality of secondary electrons emitted from the sample irradiated with the primary electron beam.