The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2026
Filed:
Jan. 22, 2024
Kla Corporation, Milpitas, CA (US);
Yun Xie, Shanghai, CN;
Rui-Fang Shi, Cupertino, CA (US);
Xin Ye, Shanghai, CN;
Heng Zhang, Shanghai, CN;
KLA Corporation, Milpitas, CA (US);
Abstract
Methods and systems for inspecting a photomask are provided. One system includes an illumination subsystem configured to direct light to the photomask. The system also includes a pupil filter positioned in a path of only the light from the photomask and configured for controlling a polarization of the light in the path by mixing four elements in a Jones matrix for the photomask in a coherent manner. In addition, the system includes a detector configured for detecting the light from the pupil filter and generating output responsive to the detected light. The system further includes a computer subsystem configured for detecting defects on the photomask based on the output.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile