The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2026

Filed:

Jun. 26, 2023
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Ta-Chun Lin, Hsinchu, TW;

Jhon Jhy Liaw, Hsinchu County, TW;

Kuo-Hua Pan, Hsinchu City, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 64/01 (2025.01); H10D 30/00 (2025.01); H10D 30/01 (2025.01); H10D 30/43 (2025.01); H10D 30/62 (2025.01); H10D 30/67 (2025.01); H10D 62/10 (2025.01); H10D 62/17 (2025.01); H10D 62/822 (2025.01); H10D 84/01 (2026.01); H10D 84/03 (2025.01); H10D 84/83 (2025.01); H10D 84/85 (2025.01); H10P 14/20 (2026.01); H10P 50/00 (2026.01); H10W 10/00 (2026.01); H10W 10/17 (2026.01); H10W 20/00 (2026.01);
U.S. Cl.
CPC ...
H10D 64/017 (2025.01); H10D 30/019 (2025.01); H10D 30/0191 (2025.01); H10D 30/024 (2025.01); H10D 30/43 (2025.01); H10D 30/501 (2025.01); H10D 30/62 (2025.01); H10D 30/6735 (2025.01); H10D 30/6757 (2025.01); H10D 62/115 (2025.01); H10D 62/116 (2025.01); H10D 62/121 (2025.01); H10D 62/235 (2025.01); H10D 62/822 (2025.01); H10D 84/0128 (2025.01); H10D 84/0135 (2025.01); H10D 84/0151 (2025.01); H10D 84/0153 (2025.01); H10D 84/0158 (2025.01); H10D 84/0193 (2025.01); H10D 84/038 (2025.01); H10D 84/83 (2025.01); H10D 84/832 (2025.01); H10D 84/834 (2025.01); H10D 84/853 (2025.01); H10P 14/3411 (2026.01); H10P 50/695 (2026.01); H10W 10/014 (2026.01); H10W 10/17 (2026.01); H10W 20/076 (2026.01);
Abstract

A semiconductor structure includes a first active region over a substrate and extending along a first direction, a gate structure over the first active region and extending along a second direction substantially perpendicular to the first direction, a gate-cut feature abutting an end of the gate structure, and a channel isolation feature extending along the second direction and between the first active region and a second active region. The gate structure includes a metal electrode in direct contact with the gate-cut feature. The channel isolation feature includes a liner on sidewalls extending along the second direction and a dielectric fill layer between the sidewalls. The gate-cut feature abuts an end of the channel isolation feature and the dielectric fill layer is in direct contact with the gate-cut feature.


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