The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 2026

Filed:

Aug. 26, 2022
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Yongwoong Jeong, Hwaseong-si, KR;

Hakjoo Lee, Hwaseong-si, KR;

Kikang Kim, Yongin-si, KR;

Jonghyun Ahn, Hwaseong-si, KR;

Youngmin Kim, Hwaseong-si, KR;

Youngsim Kim, Seongnam-Si, KR;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); C23C 16/505 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4404 (2013.01); C23C 16/4405 (2013.01); C23C 16/45542 (2013.01); C23C 16/46 (2013.01); C23C 16/505 (2013.01); C23C 16/345 (2013.01); C23C 16/401 (2013.01);
Abstract

Provided is a method for seasoning a reactor in which a dry cleaning step and a first seasoning step are carried out at the first temperature, then the temperature is raised to a second temperature. The method also comprises a second seasoning step and a substrate processing step are carried out at the second temperature. The seasoning step of the disclosure suppresses dry cleaning byproducts from evaporating, spreading and re-spreading in a reactor. Thus, deterioration of the film quality deposited on a substrate is prevented, extending the wet etch cycle of the reactor and improving the uptime and the efficiency of the reactor.


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