logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12648414 B1

PDFFull Text
Date of Patent:
Jun. 02, 2026

Filed:

Aug. 18, 2023

Forming notches on wafer sidewall for wafer cut

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Chen-Hua Yu, Hsinchu, TW;

Tung-Liang Shao, Hsinchu, TW;

Assignee:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Attorney:

Slater Matsil, LLP

Primary Examiner:

Niki H Nguyen

Int. Cl.
CPC ...
H01L 21/30 (2006.01); H01L 21/265 (2006.01); H01L 21/268 (2006.01); H01L 21/46 (2006.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76254 (2013.01); H01L 21/26506 (2013.01); H01L 21/268 (2013.01);
Abstract

A method includes implanting a substrate with a dopant to form an implanted layer in the substrate, and the implanted layer is at an intermediate level between a top surface and a bottom surface of the substrate. A laser beam is projected on the implanted layer, and is projected on a sidewall of the substrate. After the laser beam is projected, the substrate is heated, so that the substrate is cut at the implanted layer, and is cut into a top portion and a bottom portion.

Find Patent Forward Citations

Quick Actions:

Yu, Chen-Hua. (2026). Forming notches on wafer sidewall for wafer cut (U.S. Patent No. 12648414). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12648414

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…