The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2026

Filed:

Jun. 21, 2022
Applicant:

Wolfspeed, Inc., Durham, NC (US);

Inventors:

Madankumar Sampath, Morrisville, NC (US);

Sei-Hyung Ryu, Cary, NC (US);

Naeem Islam, Morrisville, NC (US);

Woongsun Kim, Cary, NC (US);

Assignee:

Wolfspeed, Inc., Durham, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/10 (2025.01); H10D 12/01 (2025.01); H10D 30/66 (2025.01); H10D 62/17 (2025.01); H10D 62/832 (2025.01); H10P 14/60 (2026.01); H10P 30/20 (2026.01);
U.S. Cl.
CPC ...
H10D 62/109 (2025.01); H10D 12/031 (2025.01); H10D 30/668 (2025.01); H10D 62/393 (2025.01); H10D 62/8325 (2025.01); H10P 14/6308 (2026.01); H10P 30/2042 (2026.01); H10P 30/222 (2026.01);
Abstract

A wide band-gap semiconductor layer structure is provided that comprises a drift region having a first conductivity type and a plurality of source regions having the first conductivity type on the drift region. A plurality of trenches are provided in an upper surface of the wide band-gap semiconductor layer structure. Second conductivity type dopants are implanted into the wide band-gap semiconductor layer structure to simultaneously form well regions underneath the source regions and trench shielding regions underneath the trenches, the well regions and the trench shielding regions each having a second conductivity type.


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