The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Feb. 26, 2021
Hitachi High-tech Corporation, Tokyo, JP;
Liang Li, Tokyo, JP;
Kosuke Matsumoto, Tokyo, JP;
Wei Chean Tan, Tokyo, JP;
Kyo Ryo, Tokyo, JP;
Junji Yamamoto, Tokyo, JP;
Hitachi High-Tech Corporation, Tokyo, JP;
Abstract
This disclosure is directed to a position specification method of specifying a position of a mark formed on a semiconductor wafer from an image of the semiconductor wafer using a computer system. The method includes a first procedure of setting a partial image region to an image, a second procedure of dividing the partial image region on the basis of a division index, and setting a part of a region of a first divided image as a reference image. The method also includes a third procedure of determining whether a mark exists in the partial image region. The method also includes a fourth procedure of calculating, when it is determined in the third procedure that a mark exists in the partial image region, a representative position of the mark in the partial image region.