The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

May. 05, 2022
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Zhi-Chang Lin, Hsinchu, TW;

Chih-Hao Wang, Hsinchu, TW;

Kuan-Lun Cheng, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 30/67 (2025.01); H10D 62/10 (2025.01); H10D 64/01 (2025.01); H10D 84/01 (2025.01); H10D 84/03 (2025.01); H10D 84/83 (2025.01);
U.S. Cl.
CPC ...
H10D 30/6735 (2025.01); H10D 62/118 (2025.01); H10D 64/01 (2025.01); H10D 84/0151 (2025.01); H10D 84/038 (2025.01); H10D 84/83 (2025.01);
Abstract

A device includes a substrate, first and second gate structures, first and second hybrid fins, and first and second sidewalls. The first gate structure is over and surrounds a first vertical stack of nanostructures. The second gate structure is over and surrounds a second vertical stack of nanostructures. The second gate structure and the first gate structure extend along a first direction, and are laterally separated from each other in a second direction, the second direction being substantially perpendicular to the first direction. The first hybrid fin extends through and under the first gate structure and the second gate structure, the extending being along the second direction. The second hybrid fin is between the first gate structure and the second gate structure. The second hybrid fin has: a first sidewall that abuts the first gate structure; and a second sidewall that abuts the second gate structure.


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