The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Jan. 10, 2023
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Meng-Han Lin, Hsinchu, TW;

Sai-Hooi Yeong, Zhubei City, TW;

Chia-En Huang, Xinfeng Township, TW;

Chi On Chui, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 64/00 (2025.01); H01L 23/528 (2006.01); H10B 51/20 (2023.01); H10D 30/01 (2025.01); H10D 30/69 (2025.01); H10D 64/68 (2025.01);
U.S. Cl.
CPC ...
H10B 51/20 (2023.02); H01L 23/5283 (2013.01); H10D 30/0415 (2025.01); H10D 30/701 (2025.01); H10D 64/689 (2025.01);
Abstract

In an embodiment, a device includes a first gate structure over a substrate, the first gate structure including a first gate electrode over a first side of a first gate dielectric; a first electrode and a second electrode disposed over a second side of the first gate dielectric opposite the first side; a second gate structure disposed between the first electrode and the second electrode, the second gate structure including a second gate electrode and a second gate dielectric, the second gate dielectric at least laterally surrounding the second gate electrode; and a semiconductor film disposed between the first electrode and the second electrode and at least laterally surrounding the second gate structure, wherein at least one of the first gate dielectric or the second gate dielectric is a memory film.


Find Patent Forward Citations

Loading…