The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

May. 10, 2022
Applicant:

Macdermid Enthone Inc., Waterbury, CT (US);

Inventors:

Donald Desalvo, Jiangsu Province, CN;

Ron Blake, Oxford, CT (US);

Carmichael Gugliotti, Bristol, CT (US);

William J. Decesare, Wolcott, CT (US);

Richard A. Bellemare, Watertown, CT (US);

Assignee:

MacDermid Enthone Inc., Waterbury, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 3/42 (2006.01); C25D 3/38 (2006.01); C25D 5/18 (2006.01); C25D 7/00 (2006.01); H05K 1/11 (2006.01);
U.S. Cl.
CPC ...
H05K 3/424 (2013.01); C25D 3/38 (2013.01); C25D 5/18 (2013.01); C25D 7/00 (2013.01); H05K 1/115 (2013.01); H05K 2201/09563 (2013.01); H05K 2203/0723 (2013.01);
Abstract

A method of copper electroplating in the manufacture of printed circuit boards. The method is used for filling through-holes and micro-vias with copper. The method includes the steps of: (1) preparing an electronic substrate to receive copper electroplating thereon; (2) forming at least one of one or more through-holes and/or one or more micro-vias in the electronic substrate; and (3) electroplating copper in the at least one or more through-holes and/or one or more blind micro-vias by contacting the electronic substrate with an acid copper electrolyte. The acid copper electrolyte is used to plate the one or more through-holes and/or the one or more blind micro-vias. A first pulse reverse plating waveform sequence is used to create a copper bridge in the center of the through-holes followed by direct plating until metallization is complete.


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