The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Jul. 30, 2021
Peking University Shenzhen Graduate School, Shenzhen, CN;
Feng Pan, Shenzhen, CN;
Shunning Li, Shenzhen, CN;
Cheng Dong, Shenzhen, CN;
Wentao Zhang, Shenzhen, CN;
Chenxin Hou, Shenzhen, CN;
Litao Chen, Shenzhen, CN;
Junjie Pan, Shenzhen, CN;
Shisheng Zheng, Shenzhen, CN;
Yuan Lin, Shenzhen, CN;
Hai Lin, Shenzhen, CN;
PEKING UNIVERSITY SHENZHEN GRADUATE SCHOOL, Shenzhen, CN;
Abstract
Disclosed are a material analysis method based on the crystal structure database, a system, a computer-readable storage medium and an application. The material analysis method includes comparing experimental pattern information obtained from examination of a to-be-tested sample with theoretical pattern information calculated from material structure data in the crystal structure database, and obtaining crystallographic information and phase composition of the to-be-tested sample through intelligent analysis. The crystallographic information include space group, unit cell parameter, and specific coordinates of atoms in unit cell. The crystal structure database has material structure data obtained by experimental measurement and/or theoretical prediction, including chemical formula, space group, unit cell parameter and specific coordinates of atoms in unit cell. Based on this method, large-scale high-throughput and high-precision material analysis can be achieved, laying the foundation for building a data mining and analysis platform for material patterns.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile