The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2026

Filed:

Feb. 02, 2022
Applicant:

Mks Instruments, Inc., Andover, MA (US);

Inventors:

Mohammad Kamarehi, Andover, MA (US);

Ilya Pokidov, Andover, MA (US);

Kenneth B Trenholm, Andover, MA (US);

Assignee:

MKS Inc., Andover, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/46 (2006.01); C23C 16/511 (2006.01); H01J 37/32 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/45536 (2013.01); C23C 16/46 (2013.01); C23C 16/511 (2013.01); H01J 37/32192 (2013.01); H01J 37/32724 (2013.01); H10P 72/0436 (2026.01); H01J 37/32229 (2013.01); H01J 37/32357 (2013.01);
Abstract

A microwave system for use within a microwave-assisted thermal atomic layer deposition system is disclosed which include at least one microwave generator configured to output at least one microwave signal, at least one waveguide assembly in communication with the at least one microwave generator and configured to receive the microwave signal, one or more isolators positioned within the waveguide assembly and configured to reduce or eliminate backscatter of the microwave signal from the waveguide assembly to the at least one microwave generator, at least one tuning device in positioned within the waveguide assembly and configured receive the microwave signal from the isolator and tune the microwave signal, and at least one microwave delivery device in communication with the waveguide assembly and configured to direct at least a portion of the microwave signal into at least one processing chamber of the microwave-assisted thermal atomic layer deposition system.


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