The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2026

Filed:

Sep. 10, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Sundararaman Narayanan, Cupertino, CA (US);

Anantha R. Sethuraman, Palo Alto, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/20 (2020.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
G06F 30/20 (2020.01); G05B 19/41875 (2013.01); G05B 2219/32368 (2013.01);
Abstract

Implementations disclosed describe a method of using a model to predict a change of a physical state of a sample caused by one or more stages of a technological process in a substrate processing apparatus and obtaining imaging data associated with an actual performance of the one or more stages of the technological process. The imaging data includes a distribution of one or more chemical elements for a number of regions of the sample. The method further includes identifying, based on the imaging data, a difference between the predicted change of the physical state of the sample and an actual change of the physical state of the sample caused by the actual performance of the one or more stages of the technological process. The method further includes determining parameters of the model based on the identified difference.


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