The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2026

Filed:

Apr. 23, 2021
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Weihong Liu, Branchburg, NJ (US);

Chunwei Chen, Whitehouse Station, NJ (US);

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); G03F 7/2004 (2013.01); G03F 7/38 (2013.01);
Abstract

The disclosed subject matter relates to resist compositions that include: (A) an acetal functionalized acrylic polymer component comprising repeat units selected from ones having structure (1), (2), (3), (4), (5), (6), and (7); (B) a tert-alkyl functionalized acrylic polymer component comprising repeat units selected from ones having structure (1a), (2a), (3a), (4a), (5a), (6a), and (7a); (C) a phenolic resin component comprising a Novolak-based resin; (D) a photo acid generator (PAG) component and (E) a solvent component where the resist compositions does not include a diazonaphthoquinone (DNQ) component.


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