The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2026
Filed:
Jun. 12, 2023
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Muneyuki Otani, Tokyo, JP;
Akira Matsubara, Iwate, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/455 (2006.01); H10P 14/60 (2026.01); H10P 14/692 (2026.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
C23C 16/401 (2013.01); C23C 16/45527 (2013.01); H10P 14/6339 (2026.01); H10P 14/69215 (2026.01); H10P 72/7621 (2026.01);
Abstract
A deposition method includes: (a) preparing a substrate with a recess on a surface thereof; (b) supplying an organic raw material gas to the surface to adsorb the organic raw material gas to the recess; (c) supplying an oxygen-containing gas to the surface to oxidize the organic raw material gas adsorbed to the recess; and (d) after the (c), supplying a first gas containing a dehydrating agent to the surface.