The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2026

Filed:

Aug. 26, 2022
Applicant:

Acm Research (Shanghai), Inc., Shanghai, CN;

Inventors:

Hao Feng, Shanghai, CN;

Yuqi Wang, Shanghai, CN;

Rong Xu, Shanghai, CN;

Xiaoyan Zhang, Shanghai, CN;

Hui Wang, Shanghai, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0604 (2026.01); H10P 72/0414 (2026.01); H10P 72/00 (2026.01); H10P 72/0402 (2026.01);
Abstract

Disclosed in an embodiment of the present invention is a substrate processing apparatus, comprising a processing chamber, a liquid supply tank and a recovery tank. A first pipeline connects a first liquid inlet and a liquid outlet of the liquid supply tank. A second pipeline connects the first pipeline and a liquid inlet of the processing chamber. A third pipeline connects the first pipeline and a first liquid inlet of the recovery tank. A fourth pipeline connects a liquid outlet of the processing chamber and a second liquid inlet of the recovery tank. A fifth pipeline connects a liquid outlet of the recovery tank and a second liquid inlet of the liquid supply tank.


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