The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2026
Filed:
Nov. 21, 2022
Lam Research Corporation, Fremont, CA (US);
Xin Meng, Ontario, CA (US);
Xinyi Chen, Beaverton, OR (US);
Sreeram Sonti, San Diego, CA (US);
Kevin Bertsch, Tigard, OR (US);
Defu Liang, Wilsonville, OR (US);
Zhuozhi Chen, Fremont, CA (US);
Rohit Ode, Portland, OR (US);
William Schlosser, Tigard, OR (US);
Tongtong Guo, Beaverton, OR (US);
Rachel E. Batzer, Tigard, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Systems and methods for redirecting cleaning chemistry flows within a multi-station semiconductor processing chamber are disclosed. In such systems, a cleaning chemistry flow, e.g., a plasma from a remote plasma generator, may be directed onto a hub of an indexer that is centrally mounted within the chamber. The hub may have features that cause the cleaning chemistry flows to be redirected in a radially outward direction. By rotating the hub and/or changing the relative elevational positions between the hub and a cleaning chemistry inlet that provides the cleaning chemistry, the cleaning chemistry may be redirected into different regions of the chamber, thereby allowing for a more thorough and complete cleaning process.