The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

Mar. 01, 2023
Applicant:

Changxin Memory Technologies, Inc., Hefei City, CN;

Inventor:

Gyuseog Cho, Hefei, CN;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/60 (2025.01); H01L 21/762 (2006.01); H10D 30/01 (2025.01); H10D 62/17 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10D 62/235 (2025.01); H01L 21/76224 (2013.01); H10D 30/603 (2025.01); H10D 62/292 (2025.01); H10D 64/519 (2025.01); H10D 30/0221 (2025.01);
Abstract

A semiconductor structure is provided. The semiconductor structure includes a substrate and a gate. The substrate has an active region which includes a first doped region, a channel region and a second doped region arranged along a first direction. The gate includes a first conductive portion and at least two second conductive portions contacted with and connected to the first conductive portion, the first conductive portion is located above an upper surface of the substrate, the second conductive portions are located below the upper surface of the substrate, adjacent second conductive portions are arranged at intervals along the first direction, and the channel region surrounds sidewalls and a bottom surface of each of the second conductive portions. A method for manufacturing a semiconductor structure is also provided.


Find Patent Forward Citations

Cho, Gyuseog. (2026). Semiconductor structure and method for manufacturing the same which increases the channel length (U.S. Patent No. 12598792). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12598792

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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