The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2026

Filed:

Aug. 25, 2022
Applicant:

Icemos Technology Limited, Belfast, GB;

Inventors:

Samuel J. Anderson, Tempe, AZ (US);

Takeshi Ishiguro, Fukushima, JP;

Cathal Duffy, Belfast, GB;

Aymeric Privat, Tempe, AZ (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 62/10 (2025.01); H10D 12/01 (2025.01); H10D 62/17 (2025.01); H10D 62/832 (2025.01); H10P 14/20 (2026.01);
U.S. Cl.
CPC ...
H10D 62/111 (2025.01); H10D 12/031 (2025.01); H10D 62/393 (2025.01); H10D 62/8325 (2025.01); H10P 14/2904 (2026.01); H10P 14/3208 (2026.01); H10P 14/3408 (2026.01);
Abstract

A semiconductor device has a substrate made of a first semiconductor material. The first semiconductor material is silicon carbide. A first semiconductor layer made of the first semiconductor material is disposed over the substrate. A second semiconductor layer made of a second semiconductor material dissimilar from the first semiconductor material is disposed over the first semiconductor layer. The second semiconductor material is silicon. A third semiconductor layer made of the second semiconductor material can be disposed between the first semiconductor layer and second semiconductor layer. A semiconductor device is formed in the second semiconductor layer. The semiconductor device can be a power MOSFET or diode. The second semiconductor layer with the electrical component provides a first portion of a breakdown voltage for the semiconductor device and the first semiconductor layer and substrate provide a second portion of the breakdown voltage for the semiconductor device.


Find Patent Forward Citations

Anderson, Samuel. (2026). Super-junction mosfet/igbt with mems layer transfer and wbg drain (U.S. Patent No. 12598782). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12598782

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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