The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Aug. 18, 2022
Carl Zeiss Multisem Gmbh, Oberkochen, DE;
Yanko Sarov, Aalen, DE;
Ulrich Bihr, Dirgenheim, DE;
Hans Fritz, Grabs, CH;
Dirk Zeidler, Oberkochen, DE;
Georg Kurij, Ulm, DE;
Ralf Lenke, Lauchheim, DE;
András G. Major, Oberkochen, DE;
Christof Riedesel, Aalen, DE;
Carl Zeiss MultiSEM GmbH, Oberkochen, DE;
Abstract
Certain improvements of multi-beam raster units such as multi-beam generating units and multi-beam deflector units of a multi-beam charged particle microscopes are provided. The improvements include design, fabrication and adjustment of multi-beam raster units including apertures of specific shape and dimensions. The improvements can enable multi-beam generation and multi-beam deflection or stigmation with higher precision. The improvements can be relevant for routine applications of multi-beam charged particle microscopes, for example in semiconductor inspection and review, where high reliability and high reproducibility and low machine-to-machine deviations are desirable.