The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Jun. 08, 2022
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Keisuke Tsugao, Koshi City, JP;
Daisuke Aoki, Koshi City, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/78 (2006.01); B01D 53/34 (2006.01);
U.S. Cl.
CPC ...
B01D 53/78 (2013.01); B01D 53/346 (2013.01); B01D 2258/0216 (2013.01);
Abstract
A gas processing apparatus includes a duct, a partition plate and a liquid supply. The duct has therein a flow path through which a gas passes. The partition plate is configured to divide the flow path into multiple spaces, and is formed of a porous material, through which the gas passes, configured to retain a liquid. The liquid supply is configured to supply a dissolving liquid configured to dissolve a target component contained in the gas to the partition plate. The gas passing through the flow path is brought into contact with the dissolving liquid retained in the partition plate.