The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
May. 13, 2020
Board of Regents, the University of Texas System, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Parth Pandya, Austin, TX (US);
Shrawan Singhal, Austin, TX (US);
Paras Ajay, Austin, TX (US);
Ziam Ghaznavi, Austin, TX (US);
Ovadia Abed, Austin, TX (US);
Michael Watts, Austin, TX (US);
Board of Regents, The University of Texas System, Austin, TX (US);
Abstract
A method and system for configuring ultraviolet (UV)-based nanoimprint lithography (NIL) for roll-to-roll (R2R) processing, which combines the benefits of inexpensive R2R processing with the precise nanoscale patterning afforded by NIL. Furthermore, an R2R fabrication process is used to create nanoscale copper (Cu) metal mesh electrodes on flexible polycarbonate substrates and rigid quartz substrates employing jet-and-flash nanoimprint lithography (J-FIL), linear ion source etching (LIS) and selective electroless Cu metallization (ECu) using a palladium (Pd) seed layer.