The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2026
Filed:
Dec. 29, 2021
L'air Liquide, Société Anonyme Pour I'etude ET I'exploitation Des Procédés Georges Claude, Paris, FR;
Masato Hirai, Yokosuka, JP;
Sunao Kamimura, Yokosuka, JP;
Ling Yun Jia, Tsukuba, JP;
Christian Dussarrat, Tokyo, JP;
Abstract
A method for forming a tin-containing film on a substrate comprises: exposing the substrate to a vapor or a liquid of a film-forming composition that comprises a tin-containing precursor having the general formula: (RSn)NR', wherein R and R′ each are independently H, a Cto Clinear, branched or cyclic alkyl group, or a Cto Clinear, branched or cyclic saturated hydrofluorocarbon group, and depositing at least part of the tin-containing precursor onto the substrate to form the tin-containing film using a deposition method. The exemplary tin-containing precursors include (MeSn)NMe, (MeSn)NEt, (MeSn)N(nPr), (MeSn)N(nBu) and (MeSn)N(CHCF).