The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Jun. 30, 2023
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kenichirou Matsuyama, Koshi, JP;

Sho Kano, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67745 (2013.01); H01L 21/6715 (2013.01); H01L 21/67225 (2013.01);
Abstract

A substrate transfer method performed in a substrate processing apparatus including a transfer mechanism group configured to transfer a substrate into a carrier via a module group and an exposure apparatus is provided. The transfer mechanism group includes a first transfer mechanism configured to transfer the substrate in an order of a pre-stage module, the exposure apparatus, and a first post-stage module, and a second transfer mechanism configured to transfer the substrate in an order of the first post-stage module, a heating module, a developing module, and a second post-stage module, and a post-stage transfer mechanism. The substrate transfer method includes acquiring a section transfer time required to transfer the substrate to a next transfer section; and performing a carry-in or a carry-out of the substrate into/from the exposure apparatus based on a maximum section transfer time, which is the longest in the acquired section transfer times.


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