The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Apr. 16, 2025
Applicant:

D2s, Inc., San Jose, CA (US);

Inventors:

Akira Fujimura, Saratoga, CA (US);

Abhishek Shendre, Fremont, CA (US);

Assignee:

D2S, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/72 (2012.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70433 (2013.01); G03F 1/72 (2013.01); G03F 7/0005 (2013.01); G03F 7/7005 (2013.01); G03F 7/70558 (2013.01);
Abstract

Methods and systems involve a plurality of patterns, each pattern in the plurality of patterns comprising a plurality of edges. Methods and systems also involve determining a neighborhood open area density for the plurality of patterns; determining a geometric loading effect correction, wherein the geometric loading effect correction comprises a calculated offset from an edge of a pattern in the plurality of patterns, and wherein the calculated offset is determined using the neighborhood open area density; and adjusting the edge of the pattern in the plurality of patterns using the geometric loading effect correction.


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