The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

Mar. 07, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Marvin Louis Bernt, Whitefish, MT (US);

Jon Woodyard, Livermore, CA (US);

Niranjan Khasgiwale, San Jose, CA (US);

Vincent Dicaprio, Pleasanton, CA (US);

Assignee:

Applied Materials Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 5/02 (2006.01); C25D 17/00 (2006.01); C25D 21/12 (2006.01); G03F 1/70 (2012.01); H01L 21/288 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
C25D 5/022 (2013.01); C25D 21/12 (2013.01); G03F 1/70 (2013.01); H01L 21/2885 (2013.01); H01L 22/12 (2013.01); C25D 17/001 (2013.01);
Abstract

Methods and apparatus for electroplating a substrate incorporate aspects of digital lithography and feedback from electroplating processes to improve characteristics of plating material based on die patterns. In some embodiments, a method of electroplating a substrate may include receiving a die design, forming a first lithographic pattern for a first substrate based on the die design, using a digital lithography process to pattern the first substrate with the first lithographic pattern, using an electroplating process to deposit material on the first substrate, using a metrology process to determine at least one parameter of the deposited material on the first substrate, and forming a second lithographic pattern from the first lithographic pattern for a second substrate based, at least in part, on the at least one parameter received directly from the metrology process on the first substrate by the digital lithographic process for the second substrate.


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