Airgaps used in backend memory structures

Abstract

Techniques are provided herein for forming backend memory structures with airgaps in an interconnect region above semiconductor devices. The airgaps may be provided between conductive features, such as wordlines, to reduce parasitic capacitance. An interconnect region above a plurality of semiconductor devices includes any number of interconnect layers. A first interconnect layer includes first conductive layers (e.g., wordlines) extending in a first direction with airgaps between adjacent first conductive layers. A second interconnect layer over the first interconnect layer includes at least portions of memory cells over corresponding first conductive layers. A third interconnect layer over the second interconnect layer includes a second conductive layer (e.g., bitline) extending in a second direction over one or more of the at least portions of memory cells. The presence of airgaps between the first conductive layers allows for a tighter pitch between memory cells and reduced total energy consumption among the memory cells.