The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2026

Filed:

Apr. 06, 2023
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Ruilong Xie, Niskayuna, NY (US);

Andrew Gaul, Halfmoon, NY (US);

Andrew M. Greene, Slingerlands, NY (US);

Julien Frougier, Albany, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 30/67 (2025.01); H10D 84/01 (2025.01); H10D 84/03 (2025.01); H10D 84/83 (2025.01); H10D 30/01 (2025.01); H10D 30/43 (2025.01); H10D 62/10 (2025.01);
U.S. Cl.
CPC ...
H10D 30/6729 (2025.01); H10D 84/013 (2025.01); H10D 84/0147 (2025.01); H10D 84/038 (2025.01); H10D 84/83 (2025.01); H10D 30/014 (2025.01); H10D 30/43 (2025.01); H10D 30/6735 (2025.01); H10D 30/6757 (2025.01); H10D 62/121 (2025.01);
Abstract

Embodiments of present invention provide a semiconductor structure. The semiconductor structure includes a first transistor having a first source/drain region and a second transistor having a second source/drain region; a first source/drain contact around the first source/drain region and a second source/drain contact around the second source/drain region; and a dielectric filler between the first source/drain contact and the second source/drain contact, wherein the dielectric filler has a first portion on top of a second portion, sidewalls of the first portion of the dielectric filler being linearly tapered to result in a width at a top of the first portion being larger than a width at a bottom of the first portion. A method of forming the same is also provided.


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