The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2026
Filed:
Jan. 06, 2022
Tokyo Electron Limited, Tokyo, JP;
Taro Ikeda, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
There is provided a plasma processing method comprising: continuously introducing electromagnetic waves into a chamber of a plasma processing apparatus, the electromagnetic waves being VHF waves or UHF waves, the electromagnetic waves being introduced into the chamber so as to form standing waves within the chamber along a lower surface of an upper electrode of the plasma processing apparatus; periodically applying a negative voltage to the upper electrode while performing said continuously introducing the electromagnetic waves; and supplying a processing gas into the chamber only during a period in which the negative voltage is applied to the upper electrode.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile