The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2026

Filed:

Mar. 03, 2023
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Vincent Claude Beugin, Nootdorp, NL;

Stijn Wilem Herman Karel Steenbrink, The Hague, NL;

Martin Ebert, Fremont, CA (US);

Diego Martinez Negrete Gasque, Delft, NL;

Hindrik Willem Mook, The Hague, NL;

Albertus Victor Gerardus Mangnus, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/28 (2013.01);
Abstract

Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.


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Beugin, Vincent. (2026). Multi-beam charged particle column (U.S. Patent No. 12562334). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12562334

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