The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2026

Filed:

Dec. 04, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Namyoon Kim, Suwon-si, KR;

Doory Kim, Seoul, KR;

Wookrae Kim, Suwon-si, KR;

Myungjun Lee, Suwon-si, KR;

Jaehwang Jung, Suwon-si, KR;

Changhoon Choi, Suwon-si, KR;

Dokyung Jeong, Seoul, KR;

Uidon Jeong, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G02B 21/00 (2006.01); G06T 5/30 (2006.01); G06T 7/13 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G02B 21/008 (2013.01); G06T 5/30 (2013.01); G06T 7/13 (2017.01); G06T 2207/10056 (2013.01); G06T 2207/10064 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A fluorescence microscopy metrology system includes an optical system configured to generate first light and second light having different wavelengths, a microscope body configured to irradiate a sample, coated with a fluorescent material, with the first light and the second light received from the optical system, and to receive fluorescence reflected from the sample, an image detection device configured to detect a fluorescence image corresponding to the received fluorescence, and a nanostructure analysis device configured to measure line edge roughness (LER) from the detected fluorescence image, to analyze power spectral density (PSD), or to detect a nanoparticle defect.


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