The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Jun. 07, 2022
Tokyo Electron Limited, Tokyo, JP;
Atsushi Shimada, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
There is provided a film forming method for a film forming apparatus which includes: a processing chamber; a plurality of sputtering targets disposed in the processing chamber; and a plurality of magnets respectively disposed at the plurality of targets. The film forming method comprises: during a sputtering process in which a selected target selected among the plurality of targets is subjected to sputtering, performing a selected-side reciprocating operation in which the magnet disposed at the selected target reciprocates in parallel to an extension direction of the selected target; and at the same time, performing at least one of an unselected-side reciprocating operation in which the magnet disposed at an unselected target that is not subjected to the sputtering among the plurality of targets reciprocates in parallel to an extension direction of the unselected target, and a separating operation in which the magnet is separated from the unselected target.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile