The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Feb. 03, 2023
Tokyo Electron Limited, Tokyo, JP;
Taro Ikeda, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus includes: a processing container; a stage in the processing container; an upper electrode provided to face a placement surface of the stage; and an exhaust duct provide to define a processing space inside the processing container together with the placement surface and the upper electrode, wherein a radial cross-section of an outer wall of the exhaust duct facing the processing space is an L-shape, the exhaust duct includes an exhaust hole communicating with an internal exhaust path, and the exhaust hole is configured such that, with respect to first and second lengths of two sides of the L-shape, a distance from a corner portion of the L-shape to the exhaust hole is equal to or less than each of the first and second lengths, the first length is 7 mm or more, and the second length is equal to or greater than the first length.