The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 2026
Filed:
Dec. 28, 2023
Gigaphoton Inc., Tochigi, JP;
Tomoyoshi Toida, Oyama, JP;
Gigaphoton Inc., Tochigi, JP;
Abstract
An EUV light generation apparatus includes a chamber; a target supply device supplying a first target; a laser device outputting first pulse laser light to be incident on the first target, outputting second pulse laser light to be incident on a second target, and adjusting a control parameter correlated with a shape of plasma generated by the second pulse laser light being incident on the second target; an EUV light concentrating mirror reflecting EUV light emitted from the plasma and concentrating the EUV light on an intermediate focal point; a camera imaging the EUV light and generating a picture including an image of the plasma; and a processor obtaining a value of the control parameter for improving circularity of a profile of the EUV light at the intermediate focal point using the picture and correlation information including a correlation between the shape of the plasma and the control parameter.