The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2026

Filed:

Aug. 01, 2023
Applicant:

Commissariat À L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Julien Buckley, Grenoble, FR;

René Escoffier, Grenoble, FR;

Cyrille Le Royer, Grenoble, FR;

Blend Mohamad, Grenoble, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/20 (2006.01); H10D 30/47 (2025.01); H10D 62/17 (2025.01); H10D 62/85 (2025.01); H10D 64/62 (2025.01); H10D 64/64 (2025.01); H10D 84/01 (2025.01);
U.S. Cl.
CPC ...
H10D 62/8503 (2025.01); H10D 30/47 (2025.01); H10D 62/343 (2025.01); H10D 62/85 (2025.01); H10D 64/62 (2025.01); H10D 64/649 (2025.01); H10D 84/01 (2025.01);
Abstract

A field effect transistor includes a substrate; an electron channel layer disposed on the substrate; a barrier layer disposed on the electron channel layer; a hole channel layer disposed on the barrier layer; a p-type doped semiconductor material layer disposed on the hole channel layer; a source electrode including a first portion in ohmic contact with the electron channel layer and a second portion in ohmic contact with the p-type doped semiconductor material layer; a drain electrode in ohmic contact with the electron channel layer; and a gate electrode disposed facing the p-type doped semiconductor material layer, between the source and drain electrodes.


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