The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
May. 16, 2023
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Arno Schmittner, Aalen, DE;
Willi Anderl, Huettlingen, DE;
Ralf Ameling, Aalen, DE;
Stefan Lippoldt, Aalen, DE;
Joram Rosseels, Putte, BE;
Rob Wilhelmus Maria Janssen, Meerssen, NL;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A field facet system for a lithography apparatus comprises: an optical element comprising a base body and an elastically deformable facet portion connected to the base body and having a light-reflecting optically active surface; and a plurality of actuating elements for deforming the facet portion to change a radius of curvature of the optically active surface. The actuating elements are operatively connected to the facet portion to isolate a heat induced deflection of the actuating elements from the facet portion so that the radius of curvature is not affected by the heat-induced deflection of the actuating elements.