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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12547076 B1

PDFFull Text
Date of Patent:
Feb. 10, 2026

Filed:

Jan. 22, 2021

Substrate processing apparatus and substrate processing method

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Koichi Matsunaga, Koshi, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorneys:

Nath, Goldberg & Meyer

Jerald L. Meyer

Tanya E. Harkins

Primary Examiner:

Ram N Kackar

Assistant Examiner:

Laureen undefined Chan

Int. Cl.
CPC ...
G03F 7/20 (2006.01); B05D 1/00 (2006.01); B05D 3/06 (2006.01); B05D 5/08 (2006.01); C09D 127/16 (2006.01); G03F 7/16 (2006.01); G03F 7/36 (2006.01); G03F 7/38 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2004 (2013.01); B05D 1/60 (2013.01); B05D 3/061 (2013.01); B05D 5/083 (2013.01); C09D 127/16 (2013.01); G03F 7/167 (2013.01); G03F 7/168 (2013.01); G03F 7/36 (2013.01); G03F 7/38 (2013.01); H01L 21/67017 (2013.01); H01L 21/67225 (2013.01);
Abstract

A substrate processing apparatus includes a hydrophobizing part configured to perform a hydrophobizing process of forming a hydrophobic film on a front surface of a substrate through vapor deposition of a hydrophobizing gas, an ultraviolet radiation part configured to radiate ultraviolet rays to a removal area on a rear surface of the substrate so as to remove the hydrophobic film formed in the removal area in the hydrophobizing process, and a resin-film forming part configured to form a fluororesin film in the removal area after the hydrophobic film is removed.

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Matsunaga, Koichi. (2026). Substrate processing apparatus and substrate processing method (U.S. Patent No. 12547076). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12547076

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