The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 2026
Filed:
Mar. 28, 2024
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Jihwan Kim, Suwon-si, KR;
Dongseok Han, Suwon-si, KR;
Kyung-Sun Kim, Suwon-si, KR;
Heewon Min, Suwon-si, KR;
Mingil Kim, Suwon-si, KR;
Yirop Kim, Suwon-si, KR;
Junghyun Song, Suwon-si, KR;
Kuihyun Yoon, Suwon-si, KR;
Woojin Jang, Suwon-si, KR;
Seunghee Cho, Suwon-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); F16J 15/10 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
F16J 15/104 (2013.01); H01L 21/6732 (2013.01); H01L 21/6831 (2013.01);
Abstract
A substrate processing apparatus includes an O-ring defined by a central axis, a first guide ring located closer to the central axis than is the O-ring, and a second guide ring located further from the central axis than is the O-ring. A thickness of each of the first guide ring and the second guide ring becomes progressively greater further from the central axis.